Ultrapure Water

Mitsubishi Chemical’s DIAION for ultrapure water is used by leading companies around the world in the semiconductor and display fields. The company can provide a stable supply of ion exchange resins for rinsing, etching and cleaning processes with extremely low impurities.

The ultrapure water (UPW) production system for semiconductor and LCD/OLED manufacturing is comprised of two systems: the primary system, which includes equipment such as ion exchange, degassing, reverse osmosis (RO), and ultraviolet (UV), and the UPW system, which includes UV, ion exchange, degassing, and ultrafiltration (UF) equipment. The use of ion exchange resins is crucial for removing ionic components in water effectively and the UPW production process requires treatment steps utilizing ion exchange resins.

• SAC: Strongly Acidic Cation Exchange Resin
• SBA: Strongly Basic Anion Exchange Resin